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Acetic Acid (CH3COOH)
Ammonium Fluoride (NH4F)
Ammonium water (NH4OH)
Hydrochloric Acid (HCl)
Hydrofluoric Acid (HF)
Hydrogen Peroxide (H2O2)
Nitric Acid (HNO3)
Phosphoric Acid (H3PO4)
Potassium Hydroxide solution (KOH)
Sodium Hydroxide solution (NaOH)
Sulfuric Acid (H2SO4)
Tetramethylammonium Hydroxide solution (TMAH)		Acetone
n-Butyl Acetate (NBA)
Butyl Diglycol (BDG)
r-Butyrolactone (GBL)
Cyclohexanone
Cyclopentanone
Dimethyl Sulfoxide (DMSO)
Isopropanol (IPA)
Methanol
Monoethanolamine (MEA)
n-Methyl-2-Pyrrolidone (NMP)
Propylene Glycol Methyl Ether (PGME)
Propylene Glycol Methyl Ether Acetate (PGMEA)
Etchants for Ag and alloy
Etchants for Al and alloy
Etchants for Au
Etchants for Cr
Etchants for Cu and alloy
Etchants for ITO
Etchants for IGZO
Etchants for Mo and alloy
Etchants for Ni
Etchants for Poly-Si
Etchants for SiO2 (BHF series)		TMAH based developer
KOH based developer
Na2CO3 based developer
K2CO3 solution
SPR series photoresist stripper
Deer Clean-LK series post ashing residue remover
CMP-M series post CMP clean solution
CMP-B series post CMP clean solution
Frontier Cleaner for Si wafer
OEL Clean series for OLED material
Etchants for Ta/TaN
Etchants for Ti/TiW