Etchant

MAE 475 series
Ag Etchant

MAE 475 series are formulated chemicals designed specifically for etching of Ag alloy, amorphous ITO/Ag(alloy), amorphous ITO/Ag(alloy)/amorphous ITO. MAE 475 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
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Al Etch series
Al Etchant

Al Etch series are functional chemicals designed specifically for etching of Al(alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). Al Etch series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
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ITO Etch 340 series
Amorphous ITO Etchant 

ITO Etch 340 series are formulated chemicals designed specifically for etching of amorphous ITO. ITO Etch 340 series are formulas based on oxalic acid.
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ITO Etch series
Poly ITO Etchant

ITO Etch 160 and ITO Etch 243 are formulated chemicals designed specifically for etching of poly ITO. ITO Etch 160 and ITO Etch 243 are formulas based on dilute aqua regia.
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BOE & BHF Series Etchant 

BOE and BHF are formulated chemicals designed specifically for etching of SiO2 and SiN. BHF series etchants contain surfactant, which enhances wettability and achieves etching uniformity. BOE and BHF are formulas based on HF and NH4F.
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MAE 295 series
LCD Cu Etchant

MAE 295 series are formulated chemicals designed specifically for etching of Cu layer and Cu/Mo stacked layers. MAE 295 series are formulas based on H2O2 and provide appropriate etching profile to satisfy LCD process application.
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MAE 420 series
Mo Etchant

MAE 420 series are formulated chemicals designed specifically for etching of Mo (alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). MAE 420 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
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Stripper

SPR Series
LCD Positive PR Stripper

LCD positive PR strippers are formulated chemicals designed specifically for the removal of positive photo-resist without metal damage. The formula based on water soluble organic solvents and amines.
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Color filter rework

SPR 1020D is a formulated chemical designed specifically for the removal of RGB, BM, PS and OC and less glass damage for FPD process.
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Photo ancillaries

RGB Developers                                              

RGB developers including CFK-D104 and CFK-D105 are formulated chemicals designed specifically for RGB and BM photoresist. The developers are formulas based on high purity KOH and surfactant, which provides good PR profile after developing.
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