Etchant

product name	description	Inquiry
MAE 295 Series	MAE 295 series are formulated chemicals designed specifically for etching of Cu layer and Cu/Mo stacked layers. MAE 295 series are formulas based on H2O2 and provide appropriate etching profile to satisfy LCD process application.
Cu Etchants	MAE 295 series are formulated chemicals designed specifically for etching of Cu layer and Cu/Mo stacked layers. MAE 295 series are formulas based on H2O2 and provide appropriate etching profile to satisfy LCD process application.
MAE 420 series	MAE 420 series are formulated chemicals designed specifically for etching of Mo (alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). MAE 420 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
Mo Etchant	MAE 420 series are formulated chemicals designed specifically for etching of Mo (alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). MAE 420 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
ITO Etchants	ITO Etch series are formulated chemicals designed specifically for etching of amorphous ITO. ITO Etch series are formulas based on oxalic acid or dilute aqua regia.
Ag Etchant	MAE 475 series are formulated chemicals designed specifically for etching of Ag alloy, amorphous ITO/Ag(alloy), amorphous ITO/Ag(alloy)/amorphous ITO. MAE 475 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
MAE 475 series	MAE 475 series are formulated chemicals designed specifically for etching of Ag alloy, amorphous ITO/Ag(alloy), amorphous ITO/Ag(alloy)/amorphous ITO. MAE 475 series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.
BOE & BHF Series Etchants	BOE and BHF are HF and NH4F based formulated chemicals designed specifically for etching of SiO2 and SiN. BHF series etchants contain surfactant, which enhances wettability and achieves etching uniformity.
Al Etch series Etchant	Al Etch series are functional chemicals designed specifically for etching of Al(alloy), Mo(Nb)/Al(Nd), Mo(Nb)/Al(Nd)/Mo(Nb). Al Etch series are formulas based on H3PO4, HNO3 and CH3COOH and provide appropriate etching profile to satisfy process application.