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| 看好台灣半導體、光電及綠能產業的成長潛力,關東鑫林配合各種先進製程,積極開發多樣化產品,提供客戶高品質、高純度之電子化學品。 | |
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| Acetic Acid (CH3COOH) Ammonium Fluoride (NH4F) Ammonium water (NH4OH) Hydrochloric Acid (HCl) Hydrofluoric Acid (HF) Hydrogen Peroxide (H2O2) Nitric Acid (HNO3) Phosphoric Acid (H3PO4) Potassium Hydroxide solution (KOH) Sodium Hydroxide solution (NaOH) Sulfuric Acid (H2SO4) Tetramethylammonium Hydroxide solution (TMAH) | | Acetone n-Butyl Acetate (NBA) Butyl Diglycol (BDG) r-Butyrolactone (GBL) Cyclohexanone Cyclopentanone Dimethyl Sulfoxide (DMSO) Isopropanol (IPA) Methanol Monoethanolamine (MEA) n-Methyl-2-Pyrrolidone (NMP) Propylene Glycol Methyl Ether (PGME) Propylene Glycol Methyl Ether Acetate (PGMEA) | |
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| Etchants for Ag and alloy Etchants for Al and alloy Etchants for Au Etchants for Cr Etchants for Cu and alloy Etchants for ITO Etchants for IGZO Etchants for Mo and alloy Etchants for Ni Etchants for Poly-Si Etchants for SiO2 (BHF series) | | TMAH based developer KOH based developer Na2CO3 based developer K2CO3 solution | |
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| SPR series photoresist stripper Deer Clean-LK series post ashing residue remover CMP-M series post CMP clean solution CMP-B series post CMP clean solution Frontier Cleaner for Si wafer OEL Clean series for OLED material Etchants for Ta/TaN Etchants for Ti/TiW | | | |
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