product name | description | Inquiry |
---|---|---|
Hydrofluoric Acid (HF) | 3nm-130nm | |
Hydrochloric Acid (HCl) | Used for cleaning silicon wafers and removing metallic impurities. | |
Ammonium Fluoride (NH4F) | Used in SiO2 and silicate materials etching processes. | |
Acetic Acid (CH3COOH) | Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists. | |
Hydrogen Peroxide (H2O2) | 3nm-130nm | |
Nitric Acid (HNO3) | 3nm-130nm | |
Phosphoric Acid (H3PO4) | 3nm-130nm | |
Sulfuric Acid (H2SO4) | 3nm-130nm | |
Ammonium Hydroxide (NH4OH) | 3nm-130nm | |
Potassium Hydroxide solution (KOH) | 3nm-130nm | |
Sodium Hydroxide solution (NaOH) | 3nm-130nm | |
Tetramethylammonium Hydroxide solution (TMAH) | 3nm-130nm |