High Purity Bulk Chemicals

High Purity Bulk Chemicals

product name description Inquiry
Hydrofluoric Acid (HF) 3nm-130nm
Hydrochloric Acid (HCl) Used for cleaning silicon wafers and removing metallic impurities.
Ammonium Fluoride (NH4F) Used in SiO2 and silicate materials etching processes.
Acetic Acid (CH3COOH) Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists.
Hydrogen Peroxide (H2O2) 3nm-130nm
Nitric Acid (HNO3) 3nm-130nm
Phosphoric Acid (H3PO4) 3nm-130nm
Sulfuric Acid (H2SO4) 3nm-130nm
Ammonium Hydroxide (NH4OH) 3nm-130nm
Potassium Hydroxide solution (KOH) 3nm-130nm
Sodium Hydroxide solution (NaOH) 3nm-130nm
Tetramethylammonium Hydroxide solution (TMAH) 3nm-130nm