High Purity Bulk Chemicals

High Purity Bulk Chemicals

product name description Inquiry
Acetic Acid (CH3COOH) Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists.
Hydrogen Peroxide (H2O2)
Nitric Acid (HNO3)
Phosphoric Acid (H3PO4)
Sulfuric Acid (H2SO4)
Ammonium Hydroxide (NH4OH)
Potassium Hydroxide solution (KOH)
Sodium Hydroxide solution (NaOH)
Tetramethylammonium Hydroxide solution (TMAH)
Acetone
n-Butyl Acetate (NBA)
Isopropanol (IPA)