| product name | description | Inquiry |
|---|---|---|
| Acetic Acid (CH3COOH) | Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists. | |
| Hydrogen Peroxide (H2O2) | ||
| Nitric Acid (HNO3) | ||
| Phosphoric Acid (H3PO4) | ||
| Sulfuric Acid (H2SO4) | ||
| Ammonium Hydroxide (NH4OH) | ||
| Potassium Hydroxide solution (KOH) | ||
| Sodium Hydroxide solution (NaOH) | ||
| Tetramethylammonium Hydroxide solution (TMAH) | ||
| Acetone | ||
| n-Butyl Acetate (NBA) | ||
| Isopropanol (IPA) |