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High Purity Bulk Chemicals
High Purity Bulk Chemicals
| product name | description | Inquiry |
|---|---|---|
| Cyclohexanone | Used as a solvent in the manufacture of photoresists and other applications. | |
| Acetone | Common solvent used for cleaning and stripping photoresists. | |
| Tetramethylammonium Hydroxide solution (TMAH) | Used as a developer for photoresists in photolithography and as an etchant for silicon. | |
| Sodium Hydroxide solution (NaOH) | Used for cleaning and etching. | |
| Potassium Hydroxide solution (KOH) | Used for anisotropic etching of silicon to create microstructures. | |
| Ammonium Hydroxide (NH4OH) | Used in cleaning processes to remove organic and inorganic contaminants. | |
| Sulfuric Acid (H2SO4) | Used for wafer cleaning with hydrogen peroxide, known as Piranha solution. | |
| Phosphoric Acid (H3PO4) | Used in etching processes, particularly for aluminum and silicon nitride. | |
| Nitric Acid (HNO3) | Used for oxidizing and cleaning silicon surfaces. | |
| Hydrogen Peroxide (H2O2) | Used with sulfuric acid for wafer cleaning and as an oxidizer in various processes. | |
| Hydrofluoric Acid (HF) | Key etchant for SiO2, used in wafer cleaning and surface preparation. | |
| Hydrochloric Acid (HCl) | Used for cleaning silicon wafers and removing metallic impurities. |