product name | description | Inquiry |
---|---|---|
Ammonium Fluoride (NH4F) | Used in SiO2 and silicate materials etching processes. | |
Acetic Acid (CH3COOH) | Used in photolithography and cleaning processes to remove organic residues and improve adhesion of photoresists. | |
n-Butyl Acetate (NBA) | IC, Logic, Memory, MEMS | |
r-Butyrolactone (GBL) | IC, Logic, Memory, MEMS | |
Butyl Diglycol (BDG) | IC, Logic, Memory, MEMS | |
Dimethyl Sulfoxide (DMSO) | IC, Logic, Memory, MEMS | |
Isopropanol (IPA) | IC, Logic, Memory, MEMS | |
Methanol | IC, Logic, Memory, MEMS | |
Monoethanolamine (MEA) | IC, Logic, Memory, MEMS | |
n-Methyl-2-Pyrrolidone (NMP) | IC, Logic, Memory, MEMS | |
Propylene Glycol Methyl Ether (PGME) | IC, Logic, Memory, MEMS | |
Propylene Glycol Methyl Ether Acetate (PGMEA) | IC, Logic, Memory, MEMS |